SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND NON-TRANSITORY COMPUTER-READABLE RECORDING MEDIUM

摘要

The present invention prevents the operation of a turbo molecular pump installed in an exhaust system from being unstable. A substrate processing device capable of processing a substrate by supplying gas to a processing space comprises: a buffer space to disperse the gas at an upper side of the processing space; a returning space through which the substrate passes when the substrate is returned to the processing space; a first exhaust pipe connected to the returning space; a second exhaust pipe connected to the buffer space; a third exhaust pipe connected to the processing space; a fourth exhaust pipe connected to each lower side of the first, second, and third exhaust pipes; a first vacuum pump installed in the first exhaust pipe; a second vacuum pump installed in the fourth exhaust pipe; a first value installed on the lower side of the first vacuum pump; a second valve installed in the second exhaust pipe; and a third valve installed in the third exhaust pipe.