| 摘要 |
PROBLEM TO BE SOLVED: To provide a photosensitive resin composition from which a pattern excellent in adhesiveness to a substrate and water resistance can be formed, a pattern forming method using the photosensitive resin composition, a black matrix formed by using a photosensitive resin composition comprising the above photosensitive resin composition and containing a light-shielding agent as a colorant, and a display device including the black matrix.SOLUTION: The photosensitive resin composition is obtained by compounding (D) a silane coupling agent having a specific structure in a photosensitive resin composition comprising (A) an alkali-soluble resin, (B) a photopolymerizable monomer, and (C) a photopolymerization initiator. |
