发明名称 HEAT-FLUX MEASURING METHOD, SUBSTRATE PROCESSING SYSTEM, AND HEAT-FLUX MEASURING MEMBER
摘要 The present invention is to provide a heat flux measuring method capable of measuring an ion flux of plasma as a heat flux in a heat flux measuring member. In the state a member (S) for measuring a first flux wherein a first layer (41), a second layer (42), and a third layer (43) are layered in order is exposed to plasma, an optical path length within the first layer (41) of low coherence light traveling back and forth in a thickness direction of the first layer (41) and an optical path length within the third layer (43) of low coherence light traveling back and forth in a thickness direction of the third layer (43) are measured from reflected light which is obtained by irradiating the low coherence light in a lamination direction. Data showing a relation of the temperature of the member (S) for measuring the first flux and the optical path of each of the low coherence lights inside the first layer (41) and the third layer (43) is recorded in advance, and then the temperatures of the first layer (41) and the third layer (43) are obtained. A heat flux (q) flowing in the member (S) for measuring the first flux is calculated from the temperature of the first layer (41) and the third layer (43), the thickness of the second layer (42), and heat conductivity.
申请公布号 KR20150076121(A) 申请公布日期 2015.07.06
申请号 KR20140188386 申请日期 2014.12.24
申请人 TOKYO ELECTRON LIMITED 发明人 KOSHIMIZU CHISHIO;MATSUDO TATSUO
分类号 H01L21/302;H01L21/205 主分类号 H01L21/302
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