THIN FILM DEPOSITION APPARATUS

摘要

The present invention relates to a thin film depositing apparatus. The thin film depositing apparatus according to the present invention includes a gas supply unit which includes at least one gas supply module which successively supplies a plurality of process gases including a raw source gas and a reactive gas and a substrate supporting unit which supports a substrate and is formed to move with regard to the gas supply unit. The substrate supporting unit performs at least one loop movement including a plurality of forward and backward movements according to a step. A loop movement distance between the initial position and the final position of the substrate is equal to or longer than the length of one gas supply module in case of one loop movement.