| 摘要 |
<p>The present invention relates to an apparatus for treating a large-area substrate. More specifically, the purpose of the present invention is to provide a large-area substrate having the arrangement of shower holes, which are formed on a shower head, formed differently for each region of the shower head. For the purpose, the apparatus for treating a large-area substrate according to the present invention comprises; a chamber having a reaction space; a substrate supporting part for supporting a large-area substrate; a diffuser cover mounted on the upper end of the substrate supporting part inside the chamber and supplying gas to be deposited on the large-area substrate; a shower head having multiple shower holes formed thereon, mounted on the lower end of the diffuser cover, and spraying the gas through the shower holes toward the substrate supporting part; and a fixing bolt mounted between the shower head and the diffuser cover to connect the shower head to the diffuser cover, wherein the arrangement of the shower holes is different for each region of the shower head.</p> |
