| 摘要 |
PROBLEM TO BE SOLVED: To provide a photosensitive composition for a color filter for a solid-state imaging device, which can maintain a pattern profile in a vertical shape and can suppress fluctuations in a film thickness of a color layer to be formed, and a color filter 4 for a solid-state imaging device, and a solid-state imaging device 1 using the above composition.SOLUTION: The photosensitive composition for a color filter 4 for a solid-state imaging device comprises a photopolymerizable monomer (A), a resin binder (B), a polymerization initiator (C), a colorant (D), an extender (E), and a solvent (F). The content of the extender (E) included in the whole solid content of the photosensitive colored composition for the color filter 4 for a solid-state imaging device is 1 mass% or more and less than 30 mass%. |
