| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide an imprint device advantageous in terms of overlay accuracy.SOLUTION: An imprint device 1 performing imprint processing for molding an imprint material on a shot region formed on the first surface of a substrate 10, by using a mold having a patterned region 8a in which a pattern is formed includes a substrate holding section 4 for holding the substrate 10, and a control section 7. The substrate holding section 4 has a heating section for deforming the shot region by irradiating the second surface on the side opposite to the first surface thereby applying heat to the substrate 10. The control section 7 controls the heating section so that the shape difference of the patterned region 8a and the shot region falls within an allowable range.</p> |
