发明名称 SAMPLE PROCESSING METHOD AND SAMPLE PROCESSING DEVICE
摘要 <p>PROBLEM TO BE SOLVED: To extract a minute sample from a material that tends to react with assist gas or tends to be etched such as a lithium-containing material or a soler material, without using the assist gas.SOLUTION: The present invention relates to adhesively bond a probe capable of extracting a minute sample to the minute sample using ionic liquid in a sample processing method for extracting the minute sample from a sample by irradiating the sample with an ion beam. According to the present invention, it is possible to extract the minute sample from a material that tends to react with assist gas or tends to be etched such as a lithium-containing material or a solder material, without using the assist gas.</p>
申请公布号 JP2015125087(A) 申请公布日期 2015.07.06
申请号 JP20130270810 申请日期 2013.12.27
申请人 HITACHI HIGH-TECHNOLOGIES CORP 发明人 KURODA YASUSHI;TOMIZAWA JUNICHIRO;NAKAZAWA HIDEKO
分类号 G01N1/28;H01J37/317 主分类号 G01N1/28
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