发明名称 LOW CAPACITY SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME
摘要 <p>PROBLEM TO BE SOLVED: To reduce the capacity of a semiconductor element, even when the element capacity is reduced by contracting the area of a low capacity PN diode, by suppressing increase in parasitic capacity due to a surface electrode.SOLUTION: Even when the element capacity is reduced by contracting the area of a low capacity PN diode 221, a film thickness of an oxide film 210 just under a surface electrode 214 is made thick and an increase in parasitic capacity due to the surface electrode 214 is suppressed, thereby capable of reducing the capacity of a semiconductor element.</p>
申请公布号 JP2015126149(A) 申请公布日期 2015.07.06
申请号 JP20130270634 申请日期 2013.12.27
申请人 PANASONIC IP MANAGEMENT CORP 发明人 ONISHI KAZUHIRO
分类号 H01L21/329;H01L21/76;H01L21/822;H01L27/04;H01L27/06;H01L29/861;H01L29/866;H01L29/868 主分类号 H01L21/329
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