| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a metal oxide thin film formed at a relatively low temperature (for example, 300°C or less), wherein the metal oxide thin film is stable with less change in physical properties due to long-term storage and heat.SOLUTION: A method of producing a metal oxide thin film performs treatments comprising a series of treatments which perform ultraviolet radiation, heating and ultraviolet radiation in this order with respect to the metal oxide thin film obtained through a film formation step at a temperature of 300°C or less.</p> |
