| 摘要 |
PROBLEM TO BE SOLVED: To provide a nozzle used for supplying a source gas in a chemical vapor deposition method, which has a double tube structure applicable for siliconizing treatment of a steel sheet, and is capable of making spraying of the source gas uniform in a width direction of a metal strip.SOLUTION: A nozzle for supplying a source gas of a chemical vapor deposition treatment has a double tube structure having: an outer tube having a closed end which is arranged in a treatment furnace which performs chemical vapor deposition treatment to a metal strip, on which a slit is provided in a tube length direction, and whose tip is closed; and an inner tube having open ends in which source gas is supplied from one end side and the other end side is open inside the outer tube. The nozzle blows out the source gas supplied from the one end side of the inner tube from the open end of the inner tube toward the closed ends of the outer tube to supply the gas into the outer tube, and blows out the gas onto the metal strip through the slit provided for the outer tube to execute the chemical vapor deposition treatment. A shield plate which adjusts flow of the source gas is provided between the inner tube and the outer tube between an end closer to the outer tube closed end of the slit provided for the outer tube and the inner tube open end, in a tube axis direction. |
