| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide an inspection apparatus capable of suppressing reduction in inspection accuracy caused by a flux.SOLUTION: An inspection apparatus 100 includes: an imaging part 41 that obtains an image at a predetermined inspection position by photographing a substrate 110 after reflow; a CPU 60 inspecting the substrate 110 on the basis of the photographed image; and flux suction fans 53a and 53b for sucking a flux generated from solder on the substrate 110.</p> |
