发明名称 HIGH BREAKDOWN-VOLTAGE SEMICONDUCTOR DEVICE
摘要 <p>PROBLEM TO BE SOLVED: To prevent reduction in the tolerance with respect to the transient voltage by suppressing avalanche breakdown of a second conductivity-type layer end part even in the case of a high breakdown voltage.SOLUTION: By forming a high concentration second conductivity-type layer 5 having higher impurity concentration than a second conductivity-type layer 4 in the inner side of a region in the second conductivity-type layer 4 facing a first conductivity-type buried layer 2, even in the case of a high breakdown voltage, avalanche breakdown of the second conductivity-type layer 4 end part is suppressed and reduction in the tolerance with respect to the transient voltage can be prevented.</p>
申请公布号 JP2015126151(A) 申请公布日期 2015.07.06
申请号 JP20130270636 申请日期 2013.12.27
申请人 PANASONIC IP MANAGEMENT CORP 发明人 ONISHI KAZUHIRO
分类号 H01L29/861;H01L29/06;H01L29/868 主分类号 H01L29/861
代理机构 代理人
主权项
地址