发明名称 |
HIGH BREAKDOWN-VOLTAGE SEMICONDUCTOR DEVICE |
摘要 |
<p>PROBLEM TO BE SOLVED: To prevent reduction in the tolerance with respect to the transient voltage by suppressing avalanche breakdown of a second conductivity-type layer end part even in the case of a high breakdown voltage.SOLUTION: By forming a high concentration second conductivity-type layer 5 having higher impurity concentration than a second conductivity-type layer 4 in the inner side of a region in the second conductivity-type layer 4 facing a first conductivity-type buried layer 2, even in the case of a high breakdown voltage, avalanche breakdown of the second conductivity-type layer 4 end part is suppressed and reduction in the tolerance with respect to the transient voltage can be prevented.</p> |
申请公布号 |
JP2015126151(A) |
申请公布日期 |
2015.07.06 |
申请号 |
JP20130270636 |
申请日期 |
2013.12.27 |
申请人 |
PANASONIC IP MANAGEMENT CORP |
发明人 |
ONISHI KAZUHIRO |
分类号 |
H01L29/861;H01L29/06;H01L29/868 |
主分类号 |
H01L29/861 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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