| 摘要 |
<p>The present invention relates to an apparatus for treating a substrate, and more specifically, to an apparatus for treating a substrate, comprising a particle influx preventing unit which can prevent influx of particles or external air current into a chamber. According to an embodiment of the present invention, the apparatus for treating the substrate comprises: a chamber in which an opening where a substrate enters is formed on a side wall, and an internal space where a process for treating the substrate is performed is formed; a shutter unit opening and closing the opening; and the particle influx preventing unit protruding from the opening and the shutter unit respectively, and preventing particles from flowing into the chamber. The particle influx preventing unit comprises: a first incline projection slantly protruding from the top of the opening to the outside of the chamber; and a second incline projection slantly formed from the shutter unit to the chamber above or below the position of the first incline projection, wherein the first incline projection and the second incline projection are located in parallel when the shutter unit closes the opening.</p> |
