Extreme Ultraviolet Light Source

摘要

A first remaining plasma that at least partially coincides with a target region is formed; a target including target material in a first spatial distribution to the target region is provided, the target material including material that emits EUV light when converted to plasma; the first remaining plasma and the initial target interact, the interaction rearranging the target material from the first spatial distribution to a shaped target distribution to form a shaped target in the target region, the shaped target including the target material arranged in the shaped spatial distribution; an amplified light beam is directed toward the target region to convert at least some of the target material in the shaped target to a plasma that emits EUV light; and a second remaining plasma is formed in the target region.

主权项

1. A method of forming a shaped target for an extreme ultraviolet light source, the method comprising:
forming a first remaining plasma that at least partially coincides with a target region; providing a target comprising target material in a first spatial distribution to the target region, the target material comprising material that emits EUV light when converted to plasma; allowing the first remaining plasma and the initial target to interact, the interaction rearranging the target material from the first spatial distribution to a shaped target distribution to form a shaped target in the target region, the shaped target comprising the target material arranged in the shaped spatial distribution; directing an amplified light beam toward the target region to convert at least some of the target material in the shaped target to a plasma that emits EUV light, the amplified light beam having an energy sufficient to convert the target material in the shaped target to plasma that emits EUV light; and allowing a second remaining plasma to form in the target region.