发明名称 |
CONTACT RESISTANCE REDUCTION IN FINFETS |
摘要 |
A semiconductor device having fin transistors includes a plurality of substantially parallel semiconductor fins formed over a substrate and a gate structure formed over the fins transversely to a longitudinal axis of the fins. Source and drain regions are formed on opposite sides of the gate structure and are merged with the fins by an epitaxially grown crystalline material between the fins in merged regions. Interface layers are formed on the fins in regions disposed apart from both sides of the gate structure. The interface layers are formed over a top and at least a portion of opposing sides of the fins. Contact lines are formed over the interface layers such that contact is made at the top surface of the interface layer on the fins and at least a portion of the sides of the interface layer on the fins. |
申请公布号 |
US2015187881(A1) |
申请公布日期 |
2015.07.02 |
申请号 |
US201514658975 |
申请日期 |
2015.03.16 |
申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION ;STMicroelectronics, Inc. |
发明人 |
BASKER VEERARAGHAVAN S.;LIU QING;YAMASHITA TENKO;YEH CHUN-CHEN |
分类号 |
H01L29/165;H01L29/78 |
主分类号 |
H01L29/165 |
代理机构 |
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代理人 |
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主权项 |
1. A semiconductor device having fin transistors, comprising:
a plurality of substantially parallel semiconductor fins formed over a substrate; a gate structure formed over the fins transversely to a longitudinal axis of the fins; source and drain regions formed on opposite sides of the gate structure and being merged with the fins by an epitaxially grown crystalline material between the fins in merged regions; interface layers formed on the fins in regions disposed apart from both sides of the gate structure, the interface layer being formed over a top and at least a portion of opposing sides of the fins; and contact lines formed over the interface layers such that contact is made at the top surface of the interface layer on the fins and at least a portion of the sides of the interface layer on the fins. |
地址 |
Armonk NY US |