发明名称 |
Method and Device for Manufacturing a Barrier Layer on a Flexible Substrate |
摘要 |
Method and apparatus for manufacturing a barrier layer on a substrate (1; 1a, 1b). An inorganic oxide layer (11) having a pore volume between 0.3 and 10 vol. % is provided on the substrate (1; 1a, 1b). Subsequently the substrate (1; 1a, 1b) with the inorganic oxide layer (11) is treated in an atmospheric glow discharge plasma to form a sealing layer (12), the plasma being generated by at least two electrodes (2, 3) in a treatment space (5) formed between the at least two electrodes (2, 3). The treatment space (5) comprises in operation a mixture of a gas comprising oxygen and precursor material in an amount between 2 and 50 ppm. A local deposition rate is controlled at 5 nm/sec or lower, using a power density of 10 W/cm2 or higher in the treatment space (5). |
申请公布号 |
US2015184300(A1) |
申请公布日期 |
2015.07.02 |
申请号 |
US201314407120 |
申请日期 |
2013.06.12 |
申请人 |
Fujifilm Manufacturing Europe BV |
发明人 |
Starostine Serguei;De Vries Hindrik |
分类号 |
C23C16/513 |
主分类号 |
C23C16/513 |
代理机构 |
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代理人 |
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主权项 |
1. A method for manufacturing a barrier layer on a substrate, the method comprising:
providing an inorganic oxide layer having a pore volume between 0.3 and 10 vol. % on the substrate; and subsequently treating the substrate with the inorganic oxide layer in an atmospheric glow discharge plasma to form a sealing layer, the plasma being generated by at least two electrodes in a treatment space formed between the at least two electrodes the treatment space comprising in operation a mixture of a gas comprising oxygen and, precursor material in an amount between 2 and 50 ppm, by controlling a local deposition rate at 5 nm/sec or lower, using a power density of 10 W/cm2 or higher in the treatment space. |
地址 |
Tilburg NL |