| 摘要 |
<p>A manufacturing method for a polymer waveguide grating, comprising: (S101) according to a type and a performance parameter of a polymer waveguide grating (4) to be manufactured, determining a grating cycle of the polymer waveguide grating (4) to be manufactured, a grating cycle number and a refractive index variation thereof at a grating; (S102) according to a relationship between the refractive index variation of a polymer material of the polymer waveguide grating (4) to be manufactured and an exposure dose of an electron beam, determining the exposure dose of the electron beam required at a grating to be formed; (S103) according to the exposure dose of an electron beam (3), setting a parameter of an electron beam exposure system; (S104) placing a substrate on whose surface a polymer waveguide (2) is formed in the electron beam exposure system, and according to the grating cycle and the grating cycle number, setting an exposure path of the electron beam exposure system; and (S105) exposing the polymer waveguide (2) using the electron beam exposure system so as to form the polymer waveguide grating (4).</p> |
