发明名称 HARDMASK COMPOSITION AND METHOD OF FORMING PATTERNS USING THE HARDMASK COMPOSITION
摘要 A hardmask composition includes a polymer including a moiety represented by the following Chemical Formula 1 and a solvent.;;In the above Chemical Formula 1, A and B are as defined in the specification.
申请公布号 US2015187589(A1) 申请公布日期 2015.07.02
申请号 US201414528029 申请日期 2014.10.30
申请人 SAMSUNG SDI CO., LTD. 发明人 NAM Youn-Hee;KIM Hea-Jung;KIM Sang-Kyun;KIM Sung-Hwan;KIM Yun-Jun;MOON Joon-Young;SONG Hyun-Ji
分类号 H01L21/308;H01L21/306;H01L21/027;C08L77/06;H01L21/02 主分类号 H01L21/308
代理机构 代理人
主权项 1. A hardmask composition, comprising: a polymer including a moiety represented by the following Chemical Formula 1, and a solvent: wherein, in the above Chemical Formula 1, A is selected from the following Group 1, and B is selected from the following Group 2, wherein, in Group 1, M and M′ are independently hydrogen or a carboxyl group (—COOH), X is a substituted or unsubstituted C1 to C20 alkylene group, a substituted or unsubstituted C3 to C20 cycloalkylene group, a substituted or unsubstituted C6 to C20 arylene group, a substituted or unsubstituted C2 to C20 heteroarylene group, a substituted or unsubstituted C2 to C20 alkenylene group, a substituted or unsubstituted C2 to C20 alkynylene group, oxygen (O), sulfur (S), a carbonyl group (—C(═O)—) SO2, NRa, SiRbRc, PRdReRf, or a combination thereof, and R and R′ are independently hydrogen, a halogen, a hydroxy group, a thionyl group, a thiol group, a cyano group, a substituted or unsubstituted amino group, a substituted or unsubstituted C1 to C30 alkyl group, a substituted or unsubstituted C3 to C30 cycloalkyl group, a substituted or unsubstituted C6 to C30 aryl group, a substituted or unsubstituted C3 to C30 cycloalkenyl group, a substituted or unsubstituted C1 to C20 alkylamine group, a substituted or unsubstituted C7 to C20 arylalkyl group, a substituted or unsubstituted C1 to C20 heteroalkyl group, a substituted or unsubstituted C2 to C30 heterocycloalkyl group, a substituted or unsubstituted C2 to C30 heteroaryl group, a substituted or unsubstituted C1 to C30 alkoxy group, a substituted or unsubstituted C2 to C30 alkenyl group, a substituted or unsubstituted C2 to C30 alkynyl group, a substituted or unsubstituted C1 to C20 aldehyde group, a substituted or unsubstituted C1 to C4 alkyl ether, a substituted or unsubstituted C7 to C20 arylalkylene ether, a substituted or unsubstituted C1 to C30 haloalkyl group, a substituted or unsubstituted C1 to C20 alkylborane group, a substituted or unsubstituted C6 to C30 arylborane group, CRgRhRi, or a combination thereof, wherein Ra, Rb, Rc, Rd, Re, Rf, Rg, Rh and Ri are independently hydrogen, a substituted or unsubstituted C1 to C10 alkyl group, a halogen, a halogen-containing group, or a combination thereof, wherein, in Group 2, Y and Y′ are independently hydrogen, a hydroxy group, a thionyl group, a thiol group, a cyano group, a substituted or unsubstituted amino group, a substituted or unsubstituted C1 to C30 alkyl group, a substituted or unsubstituted C1 to C20 alkylamine group, a substituted or unsubstituted C1 to C30 alkoxy group, NRaRb, COORc, PRjRkRlRm, or a combination thereof, X, R and R′ are the same as defined in Group 1, and Ra, Rb, Rc, Rj, Rk, Rl and Rm are independently hydrogen, a substituted or unsubstituted C1 to C10 alkyl group, a halogen, a halogen-containing group, or a combination thereof.
地址 Yongin-si KR