PHOTOSENSITIVE RESIN COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

摘要

The present invention provides a photosensitive resin composition comprising: an alkali-soluble resin (A); a compound having at least one ethylenically unsaturated double bond per molecule (B); a photo radical polymerization initiator having a keto oxime ester structure (C); and a compound represented by the Formula (1) or (2) below (D); wherein the content of the photo radical polymerization initiator (C) is 0.5 to 5 times the content of the compound (D), and the content of the photo radical polymerization initiator (C) with respect to 100 parts by mass of the compound (B) is 3 to 20 parts by mass. In Formula (1), the six R1s each independently represent a hydrogen atom or an electron-donating group, and n represents 0 or 1. In Formula (2), the six R2s each independently represent a hydrogen atom or an electron-donating group, and m represents 0 or 1.;;By use of the photosensitive resin composition of the present invention, formation of a resist pattern having excellent resolution is possible even without using an oxygen inhibition layer. By the method for producing a resist pattern of the present invention, formation of a resist pattern having excellent resolution is possible even without using an oxygen inhibition layer.

主权项

1. A photosensitive resin composition, comprising:
an alkali-soluble resin (A); a compound comprising an ethylenically unsaturated double bond per molecule (B); a photo radical polymerization initiator comprising a keto oxime ester structure (C); and a compound of Formula (1) or Formula (2) (D): wherein, in Formula (1), R1 each independently represent a hydrogen atom or an electron-donating group, and n represents 0 or 1; in Formula (2), R2 each independently represent a hydrogen atom or an electron-donating group, and m represents 0 or 1; a content by mass of the photo radical polymerization initiator (C) is 0.5 to 5 times of a content by mass of the compound (D); and a content of the photo radical polymerization initiator (C) with respect to 100 parts by mass of the compound (B) is 3 to 20 parts by mass.