发明名称 EXCIMER LASER AND EXCIMER LASER SYSTEM
摘要 This excimer laser may be provided with a laser chamber in which a gas is sealed, a pair of electrodes which are arranged inside of the laser chamber, a power source which supplies a voltage pulse across the electrodes, a gas supply unit which supplies gas to the inside of the laser chamber, a gas discharge unit which partially discharges the gas inside of the laser chamber, and a gas control unit which, on the basis of a deterioration parameter of the electrodes, controls the gas supply unit and the gas discharge unit to exchange part of the gas inside of the laser chamber. On the basis of the deterioration parameter of the electrodes, the gas control unit may determine the amount of the gas inside of the laser chamber to exchange.
申请公布号 WO2015097790(A1) 申请公布日期 2015.07.02
申请号 WO2013JP84703 申请日期 2013.12.25
申请人 GIGAPHOTON INC. 发明人 ASAYAMA TAKESHI;WAKABAYASHI OSAMU
分类号 H01S3/134;H01S3/036;H01S3/225 主分类号 H01S3/134
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