COMPOSITIONS COMPRISING HETERO-SUBSTITUTED CARBOCYCLIC ARYL COMPONENT AND PROCESSES FOR PHOTOLITHOGRAPHY

摘要

PROBLEM TO BE SOLVED: To provide new photoresist compositions useful for immersion lithography.SOLUTION: A preferred photoresist composition of the invention comprises one or more materials that have hetero-substituted carbocyclic aryl groups. A particularly preferred photoresist of the invention can exhibit reduced leakage of resist materials into an immersion fluid contacting a resist layer during immersion lithography processing.