发明名称 |
METHOD OF CONTROLLING BLOCK COPOLYMER CHARACTERISTICS AND ARTICLES MANUFACTURED THEREFROM |
摘要 |
Disclosed herein is a composition comprising a brush polymer; where the brush polymer comprises a reactive moiety that is reacted to a substrate upon which it is disposed; and a block copolymer; where the block copolymer comprises a first block and a second block that are covalently bonded to each other; where the first block comprises a first polymer and a second block comprises a second polymer; where the first polymer comprises less than or equal to 10 atomic percent polysiloxane; where the second polymer comprises at least 15 atomic percent polysiloxane; where the brush polymer is chemically different from the first polymer and the second polymer; and where the first polymer is chemically different from the second polymer; and wherein the block copolymer is disposed upon the brush polymer. |
申请公布号 |
US2015184024(A1) |
申请公布日期 |
2015.07.02 |
申请号 |
US201414580307 |
申请日期 |
2014.12.23 |
申请人 |
Dow Global Technologies LLC ;ROHM AND HAAS ELECTRONIC MATERIALS LLC |
发明人 |
CHANG Shih-Wei;PARK Jong Keun;KRAMER John W.;VOGEL Erin B.;HUSTAD Phillip D.;TREFONAS, III Peter |
分类号 |
C09D183/10 |
主分类号 |
C09D183/10 |
代理机构 |
|
代理人 |
|
主权项 |
1. A composition comprising:
a brush polymer; where the brush polymer comprises a reactive moiety that is reacted to a substrate upon which it is disposed; and a block copolymer; where the block copolymer comprises a first block and a second block that are covalently bonded to each other; where the first block comprises a first polymer and a second block comprises a second polymer; where the first polymer comprises less than or equal to 10 atomic percent of polysiloxane; where the second polymer comprises at least 15 atomic percent polysiloxane; where the brush polymer is chemically different from the first polymer and the second polymer; and where the first polymer is chemically different from the second polymer; and wherein the block copolymer is disposed upon the brush polymer. |
地址 |
Midland MI US |