CHAMBER DEVICE AND EXTREME ULTRAVIOLET LIGHT GENERATION DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a chamber device capable of enhancing flexibility in arrangement of various elements with respect to a plasma generation site.SOLUTION: A chamber device is used with an external device having an obscuration region. The chamber device includes: a chamber 10 in which EUV (extreme ultraviolet) light is generated; a collector mirror 14 provided in the chamber 10 for collecting the EUV light; a support for securing the collector mirror 14 to the chamber 10; and an output port W14 provided to the chamber 10 for allowing the EUV light collected by the collector mirror 14 to be introduced into the external device.