| 摘要 |
This extreme ultraviolet light generation apparatus may be provided with: a chamber; a target supply unit that is configured so as to output a target toward a predetermined region in the chamber; a first gas supply unit that jets a gas in the first direction toward a target track between the target supply unit and the predetermined region; and a light collecting optical system that is configured to collect pulsed laser light to the predetermined region. The extreme ultraviolet light generation apparatus may be also provided with an EUV light collecting mirror, which has a reflecting surface for collecting extreme ultraviolet light by reflecting the light in the second direction, said extreme ultraviolet light having been generated in the predetermined region, and a second gas supply unit for having a gas flow along the reflecting surface of the EUV light collecting mirror, and the first direction may have a direction component of the direction opposite to the second direction. |
