发明名称 ABRASIVE, ABRASIVE SET, AND METHOD FOR POLISHING SUBSTRATE
摘要 An abrasive which comprises a liquid medium, abrasive grains including a hydroxide of a tetravalent metallic element, a first additive, a second additive, and a third additive, wherein the first additive is at least one type selected from the group consisting of a compound having a polyoxyalkylene chain and a vinyl alcohol polymer, the second additive is a cationic polymer, and the third additive is an amino group-containing sulfonic acid compound.
申请公布号 WO2015098197(A1) 申请公布日期 2015.07.02
申请号 WO2014JP73980 申请日期 2014.09.10
申请人 HITACHI CHEMICAL COMPANY, LTD. 发明人 MINAMI HISATAKA;IWANO TOMOHIRO;AKUTSU TOSHIAKI
分类号 C09K3/14;B24B37/00;H01L21/304 主分类号 C09K3/14
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