发明名称 |
METHOD FOR MODIFYING SUBSTRATE SURFACE, MODIFYING FILM AND COATING SOLUTION USED FOR MODIFICATION OF SUBSTRATE SURFACE |
摘要 |
A method for modifying a substrate surface using a silylating agent that is capable of successfully modifying the substrate surface regardless of the substrate material; a modifying film which successfully adheres to a substrate surface regardless of the material of the substrate and provides a substrate that is surface-modified to a desired extent; and a coating solution which is capable of forming a coating film on a substrate surface. A silane compound layer is formed on the surface of the coating film by a silylating agent and is firmly affixed thereto. The surface of a substrate is treated with a metal compound that is capable of producing a hydroxyl group by hydrolysis. The substrate surface which has been treated with the metal compound is then treated with a silylating agent. |
申请公布号 |
US2015184047(A1) |
申请公布日期 |
2015.07.02 |
申请号 |
US201314423651 |
申请日期 |
2013.08.27 |
申请人 |
Tokyo Ohka Kogyo Co., Ltd. |
发明人 |
Sugawara Mai;Kumazawa Akira;Yokoi Shigeru |
分类号 |
C09K3/18;B05D5/08 |
主分类号 |
C09K3/18 |
代理机构 |
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代理人 |
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主权项 |
1. A method for modifying a substrate surface comprising:
a process of treating a surface of a substrate with a metal compound which is capable of forming a hydroxyl group by hydrolysis anda process of treating the surface of the substrate which has been treated with the metal compound, with a silylating agent. |
地址 |
Kawasaki-shi JP |