发明名称 METHOD FOR MODIFYING SUBSTRATE SURFACE, MODIFYING FILM AND COATING SOLUTION USED FOR MODIFICATION OF SUBSTRATE SURFACE
摘要 A method for modifying a substrate surface using a silylating agent that is capable of successfully modifying the substrate surface regardless of the substrate material; a modifying film which successfully adheres to a substrate surface regardless of the material of the substrate and provides a substrate that is surface-modified to a desired extent; and a coating solution which is capable of forming a coating film on a substrate surface. A silane compound layer is formed on the surface of the coating film by a silylating agent and is firmly affixed thereto. The surface of a substrate is treated with a metal compound that is capable of producing a hydroxyl group by hydrolysis. The substrate surface which has been treated with the metal compound is then treated with a silylating agent.
申请公布号 US2015184047(A1) 申请公布日期 2015.07.02
申请号 US201314423651 申请日期 2013.08.27
申请人 Tokyo Ohka Kogyo Co., Ltd. 发明人 Sugawara Mai;Kumazawa Akira;Yokoi Shigeru
分类号 C09K3/18;B05D5/08 主分类号 C09K3/18
代理机构 代理人
主权项 1. A method for modifying a substrate surface comprising: a process of treating a surface of a substrate with a metal compound which is capable of forming a hydroxyl group by hydrolysis anda process of treating the surface of the substrate which has been treated with the metal compound, with a silylating agent.
地址 Kawasaki-shi JP