SPUTTERING TARGET AND PRODUCTION METHOD

摘要

The invention concerns a sputtering target composed of an Mo alloy containing at least one metal from group 5 of the periodic table, the mean content of group 5 metal being between 5 and 15 at% and the Mo content being ≥ 80 at%. The sputtering target has a mean C / O ratio in (at% / at%) of ≥ 1. The claimed sputtering targets can be produced by shaping and have improved sputtering behaviour.