发明名称 SPLIT-GATE POWER SEMICONDUCTOR FIELD-EFFECT TRANSISTOR
摘要 The present invention generally relates to a power Field-Effect Transistor (FET) structure and manufacturing. The present invention provides a planar power Metal-Oxide-Semiconductor Field-Effect Transistor (MOSFET) and an Insulated-Gate Bipolar Transistor (IGBT) structure comprising a split gate and a semi-insulating field plate. The present invention further provides manufacturing methods for these structures.
申请公布号 WO2015096605(A1) 申请公布日期 2015.07.02
申请号 WO2014CN93007 申请日期 2014.12.04
申请人 LIANG, JIAJIN 发明人 LIANG, JIAJIN;NG, CHUN WAI;SIN, JOHNNY KIN ON
分类号 H01L29/768;H01L29/772;H01L29/78 主分类号 H01L29/768
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