发明名称 |
SPLIT-GATE POWER SEMICONDUCTOR FIELD-EFFECT TRANSISTOR |
摘要 |
The present invention generally relates to a power Field-Effect Transistor (FET) structure and manufacturing. The present invention provides a planar power Metal-Oxide-Semiconductor Field-Effect Transistor (MOSFET) and an Insulated-Gate Bipolar Transistor (IGBT) structure comprising a split gate and a semi-insulating field plate. The present invention further provides manufacturing methods for these structures. |
申请公布号 |
WO2015096605(A1) |
申请公布日期 |
2015.07.02 |
申请号 |
WO2014CN93007 |
申请日期 |
2014.12.04 |
申请人 |
LIANG, JIAJIN |
发明人 |
LIANG, JIAJIN;NG, CHUN WAI;SIN, JOHNNY KIN ON |
分类号 |
H01L29/768;H01L29/772;H01L29/78 |
主分类号 |
H01L29/768 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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