| 摘要 |
<p>PROBLEM TO BE SOLVED: To measure thickness of a ceramics member disposed within a processing chamber in a desired opportunity.SOLUTION: A thickness/temperature measuring apparatus 50 configured to measure thickness of a ceramics member 35 disposed within a chamber 11 held in a vacuum atmosphere includes: a terahertz wave generation unit 51 that outputs a terahertz wave; a terahertz wave analysis unit 53 that analyzes the inputted terahertz wave; and an optical system including a half mirror 52 for guiding the terahertz wave outputted from the terahertz wave generation unit 51 to the ceramics member 35 and guiding a reflection wave from the ceramics member 35 to the terahertz wave analysis unit 53. The terahertz wave analysis unit 53 performs Fourier transformation on a reflection wave spectrum from the ceramics member 35, thereby calculating an optical path difference between a reflection wave from a front side of the ceramics member 35 and a reflection wave from a rear side, and thickness (d) of the ceramics member 35 is calculated from the calculated optical path difference.</p> |
