发明名称 |
PHOTO-PATTERNABLE DIELECTRIC MATERIALS AND FORMULATIONS AND METHODS OF USE |
摘要 |
Silsesquioxane polymers, silsesquioxane polymers in negative tone photo-patternable dielectric formulations, methods of forming structures using negative tone photo-patternable dielectric formulations containing silsesquioxane polymers, and structures made from silsesquioxane polymers. |
申请公布号 |
US2015189743(A1) |
申请公布日期 |
2015.07.02 |
申请号 |
US201514644416 |
申请日期 |
2015.03.11 |
申请人 |
International Business Machines Corporation |
发明人 |
Allen Robert D.;Brock Phillip J.;Davis Blake W.;Lin Qinghuang;Miller Robert D.;Nelson Alshakim;Sooriyakumaran Ratnam |
分类号 |
H05K1/03 |
主分类号 |
H05K1/03 |
代理机构 |
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代理人 |
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主权项 |
1. A structure, comprising:
a cross-linked layer of a silsesquioxane polymer or a silsesquioxane polymer on a substrate; a trench in said cross-linked layer; an electrically conductive material filling said trench and contacting said substrate in a bottom of said trench; and a silsesquioxane polymer, wherein said silsesquioxane polymer includes at least one monomer of the structure: where wherein R3 is selected from the group consisting of linear alkyl, branched alkyl and cycloalkyl moieties. |
地址 |
Armonk NY US |