发明名称 PHOTO-PATTERNABLE DIELECTRIC MATERIALS AND FORMULATIONS AND METHODS OF USE
摘要 Silsesquioxane polymers, silsesquioxane polymers in negative tone photo-patternable dielectric formulations, methods of forming structures using negative tone photo-patternable dielectric formulations containing silsesquioxane polymers, and structures made from silsesquioxane polymers.
申请公布号 US2015189743(A1) 申请公布日期 2015.07.02
申请号 US201514644416 申请日期 2015.03.11
申请人 International Business Machines Corporation 发明人 Allen Robert D.;Brock Phillip J.;Davis Blake W.;Lin Qinghuang;Miller Robert D.;Nelson Alshakim;Sooriyakumaran Ratnam
分类号 H05K1/03 主分类号 H05K1/03
代理机构 代理人
主权项 1. A structure, comprising: a cross-linked layer of a silsesquioxane polymer or a silsesquioxane polymer on a substrate; a trench in said cross-linked layer; an electrically conductive material filling said trench and contacting said substrate in a bottom of said trench; and a silsesquioxane polymer, wherein said silsesquioxane polymer includes at least one monomer of the structure: where wherein R3 is selected from the group consisting of linear alkyl, branched alkyl and cycloalkyl moieties.
地址 Armonk NY US