发明名称 |
Zinc Blende Cadmium-Manganese-Telluride with Reduced Hole Compensation Effects and Methods for Forming the Same |
摘要 |
Embodiments provided herein describe methods for forming cadmium-manganese-telluride (CMT), such as for use in photovoltaic devices. A substrate including a material with a zinc blende crystalline structure is provided. CMT is formed above the substrate. During the formation of the CMT, cation-rich processing conditions are maintained. The resulting CMT may be more readily provided with p-type dopants when compared to conventionally-formed CMT. |
申请公布号 |
US2015187982(A1) |
申请公布日期 |
2015.07.02 |
申请号 |
US201314141408 |
申请日期 |
2013.12.26 |
申请人 |
Intermolecular, Inc. |
发明人 |
Barabash Sergey;Bayati Amir;Pramanik Dipankar;Sun Zhi-Wen |
分类号 |
H01L31/18 |
主分类号 |
H01L31/18 |
代理机构 |
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代理人 |
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主权项 |
1. A method for forming cadmium-manganese-telluride (CMT), the method comprising:
positioning a substrate in a processing chamber of a physical vapor deposition (PVD) tool, wherein the PVD tool further comprises at least one target in the processing chamber, the at least one target comprising cadmium, manganese, tellurium, or a combination thereof; introducing dimethyl cadmium gas into the processing chamber; and causing material to be ejected from the at least one target, the material forming CMT above the substrate. |
地址 |
San Jose CA US |