| 摘要 |
A platform stabilization system comprises a support frame, a platform and a plurality of isolators each extending directly between the support frame and the platform. Each isolator permits linear movement of the platform relative to the support frame with three degrees of freedom and permits rotational movement of the platform relative to the support frame with three degrees of freedom. The isolators cooperate to form an isolation array supporting the platform directly within, and spacing the platform from, the support frame. The isolation array permits limited linear movement of the platform within the support frame with three degrees of freedom and permits limited rotational movement of the platform relative to the support frame with three degrees of freedom. The isolation array is substantially more resistant to linear movement of the platform than to rotational movement of the platform and does not rotationally constrain the platform. |
