发明名称 INTERPOSER SUBSTRATE AND METHOD FOR MANUFACTURING THE SAME
摘要 <p>A method for manufacturing an interposer substrate according to the present invention includes the steps of: aligning a first mask and exposing the substrate to light by using a first exposure dose; aligning a second mask which has a pattern which is different from the pattern of the first mask and exposing the substrate to the light by using a second exposure dose; forming a groove by etching the exposed substrate; and forming a metal wire on the substrate by filling the groove with metal.</p>
申请公布号 KR20150074872(A) 申请公布日期 2015.07.02
申请号 KR20130163059 申请日期 2013.12.24
申请人 KOREA ELECTRONICS TECHNOLOGY INSTITUTE 发明人 PARK, JONG CHUL;KIM, JUN CHUL;KIM, DONG SU;YOOK, JONG MIN
分类号 H01L23/12 主分类号 H01L23/12
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