INTERPOSER SUBSTRATE AND METHOD FOR MANUFACTURING THE SAME
摘要
<p>A method for manufacturing an interposer substrate according to the present invention includes the steps of: aligning a first mask and exposing the substrate to light by using a first exposure dose; aligning a second mask which has a pattern which is different from the pattern of the first mask and exposing the substrate to the light by using a second exposure dose; forming a groove by etching the exposed substrate; and forming a metal wire on the substrate by filling the groove with metal.</p>
申请公布号
KR20150074872(A)
申请公布日期
2015.07.02
申请号
KR20130163059
申请日期
2013.12.24
申请人
KOREA ELECTRONICS TECHNOLOGY INSTITUTE
发明人
PARK, JONG CHUL;KIM, JUN CHUL;KIM, DONG SU;YOOK, JONG MIN