METHOD FOR DESIGNING PHOTOMASK AND COMPUTER READABLE RECORDING MEDIUM RECORDED WITH PHOTOMASK DESIGN PROGRAM

摘要

A method for designing a photomask includes preparing mask layout data including first pattern data and second pattern data, the first pattern data including shape information of a design pattern, and the second pattern data including the shape information of the design pattern and array information, assigning a first photoshoot region to the mask layout data, and when the first photoshoot region overlaps the second pattern data, determining whether or not the first photoshoot region overlaps the second pattern data and reconstructing the second pattern data according to a boundary of the first photoshoot region.

主权项

1. A method for designing a photomask, the method comprising:
preparing mask layout data comprising first pattern data and second pattern data, the first pattern data comprising shape information of a design pattern, and the second pattern data comprising the shape information of the design pattern and array information; assigning a first photoshoot region to the mask layout data; determining whether or not the first photoshoot region overlaps the second pattern data; and when the first photoshoot region overlaps the second pattern data, reconstructing the second pattern data according to a boundary of the first photoshoot region.