| 摘要 |
<p>The present invention relates to a control device for a substrate deposition device and a control method thereof capable of measuring and determining the overall surface state of a substrate using temperatures detected by a temperature detection part for detecting the temperatures of a substrate. The control device for a substrate deposition device comprises: a temperature detection part for detecting the temperature of a substrate to be deposited in a chamber and a susceptor for supporting the substrate; a waveform deduction part for deducting a waveform of temperature variation against time from the temperatures detected by the temperature detection part; a section division part for dividing the temperature waveform into a susceptor section corresponding to the temperatures of the susceptor and a substrate section corresponding to the temperatures of the substrate; and a determination part for determining the surface state of the substrate according to the temperature waveform of the substrate section. Thus, the present invention can reduce the manufacturing costs of a substrate deposition device and can make the configuration simple.</p> |
