| 摘要 |
PROBLEM TO BE SOLVED: To facilitate control over the tilt angle of a side wall of an opening pattern.SOLUTION: There is provided a method of forming a film deposition mask in which an opening pattern 4 which is polygonal in plan view is formed by irradiating a resin-made film 20 with laser light L. The opening pattern 4 which has an opening inclined to widen toward a side of an irradiation surface for the laser light L and has at least a pair of opposite side walls 4a is formed by irradiating the film 20 with the laser light L shaped using a beam shaping mask 10 which has a light transmission window 18 that the laser light passes through and is gradually decreased in light transmissivity at least in sideward regions of a pair of sides outside the light transmission window 18 laterally from an edge part of the light transmission window. |
