High Productivity Combinatorial Testing of Multiple Work Function Materials on the Same Semiconductor Substrate

摘要

Provided are methods of high productivity combinatorial (HPC) screening of work function materials. Multiple test materials may be deposited as separate blanket layers on the same substrate while still forming individual interfaces with a common base layer. The thickness of each test material layer ensures that its work function properties are not impacted when other layers are deposited over that layer. A method may involve depositing a blocking layer over the base layer and selectively removing the blocking layer from a first site isolated region. A first test material is then deposited as a blanket layer and forms an interface with the base layer in that first region only. The first test material layer and the blocking layer are selectively removed from a second site isolated region followed by depositing a second test material layer as another blanket layer, which forms an interface with the base layer in the second region only.

主权项

1. A method of high productivity combinatorial (HPC) testing of multiple work function materials on a semiconductor substrate, the method comprising:
providing the semiconductor substrate comprising a first layer,
the substrate having multiple site isolated regions; depositing a second layer on the semiconductor substrate over the first layer; selectively removing a first portion of the second layer in a first site isolated region of the multiple site isolated regions thereby creating a first exposed portion of the first layer; depositing a first test layer over the second layer and the first exposed portion of the first layer,
the first test layer comprising a first work function material; selectively removing a second portion of the second layer and a first portion of the first test layer in a second site isolated region of the multiple site isolated regions thereby creating a second exposed portion of the first layer; depositing a second test layer over the first test layer and the second exposed portion of the first layer; and measuring one or more work function properties in the first site isolated region and the second site isolated region of the substrate.