MAGNETRON SPUTTERING APPARATUS

摘要

To provide technology that can increase the productivity of an apparatus when magnetron sputtering is carried out using a target formed from magnetic material. The present disclosure is an apparatus provided with: a cylindrical body that is a target formed from magnetic material, disposed above a substrate; a rotating mechanism that rotates this cylindrical body around the axis of the cylindrical body; a magnet array provided inside a hollow part of the cylindrical body; and a power supply that applies voltage to the cylindrical body. Furthermore, the magnet array has a cross sectional profile, orthogonal to the axis of the cylindrical body. Thus, even if a target with a comparatively large thickness is used, reductions in the intensity of the magnetic field that leaks from the target can be suppressed, and local progress in erosion can be suppressed.

主权项

1. A magnetron sputtering apparatus of forming a film on a substrate mounted on a rotatable mounting part inside a vacuum vessel by a magnetron sputtering method, the magnetron sputtering apparatus comprising:
a cylindrical body that is a target comprising a magnetic material and disposed above the substrate such that a central axis of the cylindrical body is offset from a central axis of the substrate in a direction along a surface of the substrate; a rotary mechanism configured to rotate the cylindrical body around the axis of the cylindrical body; a magnet arrangement assembly installed in a hollow portion of the cylindrical body; and a power supply configured to apply a voltage to the cylindrical body, wherein a cross section of the magnet arrangement assembly perpendicular to the axis of the cylindrical body is shaped such that a central portion of the magnet arrangement assembly protrudes toward a peripheral surface of the cylindrical body by more than both ends of the magnetic arrangement assembly in a circumferential direction of the cylindrical body.