| 摘要 |
PROBLEM TO BE SOLVED: To provide a molecular layer deposition (MLD) on a substrate using a radical.SOLUTION: In a method of depositing a material on a substrate 120, the method includes: a step of depositing the material on the substrate 120 by exposing the substrate 120 to a metal-containing precursor and allowing the substrate 120 to absorb a metallic atom of the metal-containing precursor; a step of depositing a material layer by exposing the substrate 120 into which the metal-containing precursor is implanted to an organic precursor and allowing the organic precursor to react with the metallic atom absorbed into the substrate 120; and a step of increasing reactivity of the material deposited on the substrate 120 by exposing the substrate 120 to a radical of a reducing agent. |
