发明名称 SEMICONDUCTOR DEVICE, RELATED MANUFACTURING METHOD, AND RELATED ELECTRONIC DEVICE
摘要 A semiconductor device may include a first-type substrate. The semiconductor device may further include a second-type well configured to form a PN junction with the first-type substrate. The semiconductor device may further include a diode component configured to form a diode with the second-type well. The diode may be connected to the PN junction in a reverse series connection. The second-type may be N-type if the first-type is P-type, and wherein the second-type may be P-type if the first-type is N-type.
申请公布号 US2015187928(A1) 申请公布日期 2015.07.02
申请号 US201414532624 申请日期 2014.11.04
申请人 Semiconductor Manufacturing International (Shanghai) Corporation 发明人 WANG Ming;MA Qiancheng;CHENG Yong;TENG Lihua
分类号 H01L29/78;H01L21/8234;H01L29/872;H01L27/07;H01L29/66;H01L21/265 主分类号 H01L29/78
代理机构 代理人
主权项 1. A semiconductor device comprising: a first-type substrate; a second-type well configured to form a PN junction with the first-type substrate; and a diode component configured to form a diode with the second-type well, wherein the diode is connected to the PN junction in a reverse series connection, wherein the second-type is N-type if the first-type is P-type, and wherein the second-type is P-type if the first-type is N-type.
地址 Shanghai CN