LIGHTING DEVICE USING LINE SHAPED BEAM

摘要

Provided is a lighting device capable of implementing optical images having desired shapes through a pattern design, the lighting device including: a light source portion having at least one light source; a light guide portion having a larger thickness than a height of a light emitting surface of the light source and irradiated by an incident beam from a side; and a three-dimensional effect forming portion provided inside the light guide portion, on a first surface, or on a second surface opposite to the first surface, wherein the three-dimensional effect forming portion includes multiple patterns sequentially arranged and having respective inclined surfaces with inclined angles with respect to the first surface, wherein the multiple patterns guide light passing along the light guide portion into a first surface direction or a second surface direction by refraction and reflection from the inclined surfaces, thereby implementing line shaped beams of a first path.

主权项

1. A lighting device, comprising:
a light source portion having at least one light source; a light guide portion having a larger thickness than a height of a light emitting surface of the light source and irradiated by an incident beam of the light source from a side; and a three-dimensional effect forming portion provided inside the light guide portion on a first surface of the light guide portion or on a second surface opposite to the first surface; and wherein the three-dimensional effect forming portion comprises multiple patterns sequentially arranged and having respective inclined surfaces with inclined angles with respect to the first surface, wherein the multiple patterns guide light passing along the light guide portion into a first surface direction toward which the first surface looks, or a second surface direction toward which the second surface looks by refraction and reflection from the inclined surfaces, thereby implementing line shaped beams of a first path crossing at right angles to respective pattern extension directions of the multiple patterns.