| 摘要 |
The purpose of the present invention is to provide a pattern measurement device for quantitatively evaluating a pattern formed using a directed self-assembly (DSA) method with high accuracy. The present invention is a pattern measurement device for measuring distances between patterns formed in a sample, wherein the centroids of a plurality of patterns included in an image are determined; the inter-centroid distances, and the like, of the plurality of centroids are determined; and on the basis of the inter-centroid distances, and the like, of the plurality of centroids, a pattern meeting specific conditions is distinguished from patterns different from the pattern meeting the specific conditions or information is calculated about the number of the patterns meeting the specific conditions, the size of an area including the patterns meeting the specific conditions, and the number of imaginary lines between the patterns meeting the specific conditions. |
