发明名称 |
FINE CONCAVO-CONVEX STRUCTURE PRODUCT, HEAT-REACTIVE RESIST MATERIAL FOR DRY ETCHING, MOLD MANUFACTURING METHOD AND MOLD |
摘要 |
A fine concavo-convex structure product (10) is provided with an etching layer (11), and a resist layer (12) comprised of a heat-reactive resist material for dry etching provided on the etching layer (11), a concavo-convex structure associated with opening portions (12a) formed in the resist layer (12) is formed in the etching layer (11), a pattern pitch P of a fine pattern of the concavo-convex structure ranges from 1 nm to 10 μm, a pattern depth H of the fine pattern ranges from 1 nm to 10 μm, and a pattern cross-sectional shape of the fine pattern is a trapezoid, a triangle or a mixed shape thereof. The heat-reactive resist material for dry etching has, as a principal constituent element, at least one species selected from the group consisting of Cu, Nb, Sn, Mn, oxides thereof, nitrides thereof and NiBi. |
申请公布号 |
US2015183152(A1) |
申请公布日期 |
2015.07.02 |
申请号 |
US201514656012 |
申请日期 |
2015.03.12 |
申请人 |
ASAHI KASEI E-MATERIALS CORPORATION |
发明人 |
MITAMURA Yoshimichi |
分类号 |
B29C59/00;B29C33/42;B29C33/38;G03F7/075;G03F7/04 |
主分类号 |
B29C59/00 |
代理机构 |
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代理人 |
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主权项 |
1. A fine concavo-convex structure product comprising:
an etching layer; and a resist layer comprised of a heat-reactive resist material for dry etching provided on the etching layer, wherein a concavo-convex structure associated with opening portions formed in the resist layer is formed in the etching layer, a pattern pitch P of a fine pattern of the concavo-convex structure ranges from 1 nm to 10 μm, a pattern depth H of the fine pattern ranges from 1 nm to 10 μm, and a pattern cross-sectional shape of the fine pattern is a trapezoid, triangle or a mixed shape of thereof. |
地址 |
Tokyo JP |