Asymmetric Template Shape Modulation for Partial Field Imprinting

摘要

Systems and methods for partial field imprinting are provided such that imprint templates are asymmetrically modulated to allow initial contact with a partial field on a substrate at a location spaced apart from the template center.

主权项

1. A nanoimprint lithography system for imprinting a partial field of a substrate, the system comprising:
a template chuck configured to retain an imprint lithography template, the template chuck having a central axis oriented normal to the template chuck and passing through the center of the template when retained thereon; and a plurality of actuators positioned in proximity to the template chuck and at locations spaced apart from the central axis, each of said actuators capable of providing a force to the retained template to deflect portions of the retained template away from the template chuck; and a controller configured to actuate the actuators in a manner to asymmetrically deflect a portion of the retained template away from the template chuck such that the maximum deflection of the template occurs at a location spaced apart from the central axis.