| 发明名称 |
CLEANSING COMPOSITION FOR HORMONE DEPOSITION |
| 摘要 |
Materials and apparatus are provided for hormone deposition in a cleansing composition. A cleansing composition includes a number of surfactants disposed within the cleansing composition. The cleansing composition also includes a dermal absorption enhancer disposed within the cleansing composition configured to deposit a hormone onto a skin surface. The cleansing composition also includes a number of hormones disposed within the cleansing composition, in which the number of hormones are configured to be deposited on a skin surface. |
| 申请公布号 |
US2015182451(A1) |
申请公布日期 |
2015.07.02 |
| 申请号 |
US201314141647 |
申请日期 |
2013.12.27 |
| 申请人 |
The Dial Corporation |
发明人 |
Luciow Chris;Stamper Aurora;Conway Mary J. |
| 分类号 |
A61K9/00;A61K47/14;A61K38/27;A61K47/10;A61K31/568;A61K31/565 |
主分类号 |
A61K9/00 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A cleansing composition for hormone deposition, comprising:
at least one anionic surfactant disposed at a concentration ranging between 5.0 and 50.0 weight % within the cleansing composition and selected from the group consisting of alkyl ether sulfates, alkyl sulfates, and alkyl sulfonates; a dermal absorption enhancer disposed within the cleansing composition to deposit a hormone onto a skin surface and comprising a positively charged quaternary ammonium compound or salt thereof; and at least one hormone disposed within the cleansing composition, in which the at least one hormone is configured to be deposited on the skin surface. |
| 地址 |
Scottsdale AZ US |
