METHOD FOR MANUFACTURING PATTERN FORMED BODY

摘要

The purpose of the present invention is to provide a method for manufacturing a pattern formed body, capable of accurately forming a pattern faithful to a mask pattern when irradiating an organic monomolecular film such as an SAM with vacuum-ultraviolet light through a mask under an atmosphere containing oxygen. The method for manufacturing a pattern formed body includes a step of removing a portion of an organic monomolecular film to form a pattern by irradiating a pattern forming substrate covered with the organic monomolecular film with vacuum-ultraviolet light through a mask under an atmosphere containing oxygen, and is characterized in that the vacuum-ultraviolet light has a continuous spectrum in the wavelength range from 180 nm to 200 nm.