发明名称 MANUFACTURING METHOD FOR ARRAY SUBSTRATE, ARRAY SUBSTRATE AND DISPLAY DEVICE
摘要 A manufacturing method for an array substrate, an array substrate and a display device. The method comprises: forming a gate line (11), a gate electrode (1) and a gate insulating layer (2) which covers the gate line and the gate electrode on a first surface of a substrate body (9); forming a semiconductor thin film (32) on the gate insulating layer (2); patterning the semicondumctor thin film (32) by taking the gate electrode (1) and the gate line (11) as masks, so as to form a source semiconductor layer located inside a region where the gate line and the gate electrode are located; and manufacturing a target semiconductor layer (13) using the source semiconductor layer. The present invention can avoid dislocation of an active layer, thus avoiding the problem of non-uniform brightness of a display caused by the dislocation of the active layer.
申请公布号 WO2015096395(A1) 申请公布日期 2015.07.02
申请号 WO2014CN78921 申请日期 2014.05.30
申请人 BOE TECHNOLOGY GROUP CO., LTD. 发明人 TIAN, XIAOXIONG;ZHANG, ZHUO;DENG, WEI
分类号 H01L21/77;H01L27/12 主分类号 H01L21/77
代理机构 代理人
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