发明名称 |
MANUFACTURING METHOD FOR ARRAY SUBSTRATE, ARRAY SUBSTRATE AND DISPLAY DEVICE |
摘要 |
A manufacturing method for an array substrate, an array substrate and a display device. The method comprises: forming a gate line (11), a gate electrode (1) and a gate insulating layer (2) which covers the gate line and the gate electrode on a first surface of a substrate body (9); forming a semiconductor thin film (32) on the gate insulating layer (2); patterning the semicondumctor thin film (32) by taking the gate electrode (1) and the gate line (11) as masks, so as to form a source semiconductor layer located inside a region where the gate line and the gate electrode are located; and manufacturing a target semiconductor layer (13) using the source semiconductor layer. The present invention can avoid dislocation of an active layer, thus avoiding the problem of non-uniform brightness of a display caused by the dislocation of the active layer. |
申请公布号 |
WO2015096395(A1) |
申请公布日期 |
2015.07.02 |
申请号 |
WO2014CN78921 |
申请日期 |
2014.05.30 |
申请人 |
BOE TECHNOLOGY GROUP CO., LTD. |
发明人 |
TIAN, XIAOXIONG;ZHANG, ZHUO;DENG, WEI |
分类号 |
H01L21/77;H01L27/12 |
主分类号 |
H01L21/77 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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