发明名称 III-V GROUP SEMICONDUCTOR TRANSISTOR AND METHOD OF MANUFACTURING THE SAME
摘要 Disclosed are a III-V group semiconductor transistor and a manufacturing method thereof. The disclosed method for manufacturing the III-V group semiconductor transistor includes the steps of: forming a III-V group semiconductor channel layer on the substrate; forming a gate insulation layer to cover the channel layer; and forming a protection layer which includes sulfur between the gate insulation layer and the channel layer by thermally processing the substrate under an atmosphere with the sulfur.
申请公布号 KR20150073290(A) 申请公布日期 2015.07.01
申请号 KR20130160672 申请日期 2013.12.20
申请人 SAMSUNG ELECTRONICS CO., LTD.;INDUSTRY-UNIVERSITY COOPERATION FOUNDATION HANYANG UNIVERSITY ERICA CAMPUS 发明人 CHO, YOUNG JIN;PARK, TAE JOO;LEE, DONG SOO;LEE, MYOUNG JAE;CHO, SEONG HO
分类号 H01L29/78;H01L21/336;H01L29/20 主分类号 H01L29/78
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