III-V GROUP SEMICONDUCTOR TRANSISTOR AND METHOD OF MANUFACTURING THE SAME
摘要
Disclosed are a III-V group semiconductor transistor and a manufacturing method thereof. The disclosed method for manufacturing the III-V group semiconductor transistor includes the steps of: forming a III-V group semiconductor channel layer on the substrate; forming a gate insulation layer to cover the channel layer; and forming a protection layer which includes sulfur between the gate insulation layer and the channel layer by thermally processing the substrate under an atmosphere with the sulfur.
申请公布号
KR20150073290(A)
申请公布日期
2015.07.01
申请号
KR20130160672
申请日期
2013.12.20
申请人
SAMSUNG ELECTRONICS CO., LTD.;INDUSTRY-UNIVERSITY COOPERATION FOUNDATION HANYANG UNIVERSITY ERICA CAMPUS
发明人
CHO, YOUNG JIN;PARK, TAE JOO;LEE, DONG SOO;LEE, MYOUNG JAE;CHO, SEONG HO