| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To prepare a Cu-Ga alloy sputtering target with a small oxygen content. <P>SOLUTION: Mixed powder including Cu powder and Ga mixed at a mass ratio of 85:15 to 55:45, and having an oxygen content of≤0.2 wt.% is alloyed in an atmosphere of an oxygen partial pressure of≤20 Pa, and the resulting Cu-Ga alloy powder is sintered by a hot pressing method. <P>COPYRIGHT: (C)2012,JPO&INPIT</p> |
